| 摘要 |
PURPOSE: A thinner composition for removing a photosensitive resin or antireflective coating is provided to effectively remove a photosensitive film in short time which is unnecessary attached and to have excellent solubility and EBR performance to a photoresist and underlayer for EUV. CONSTITUTION: A thinner composition for removing a photosensitive resin comprises 1-30 weight% of propylene glycol alkyl ether, 10-70 weight% of alkyl lactate, and 10-70 weight% of cycloketone. The propylene glycol alkyl ether is one or more selected form a propylene glycol monomethyl ether, propylene glycol monomethyl ether, and a mixture thereof. The alkyl lactate is one or more selected from methyl lactate, ethyl lactate, and a mixture thereof. The cyclo ketone is one or more selected from cyclobutanone, cyclohexanone, and a mixture thereof. The thinner composition additionally comprises a surfactant. |
