发明名称 |
Method for producing a copolymer solution with a uniform concentration for semiconductor lithography |
摘要 |
A method of producing a copolymer solution for semiconductor lithography having a copolymer and a solvent for coating film formation, which copolymer contains at least one repeating unit selected from the group consisting of: a repeating unit (A) having a hydroxyl group; a repeating unit (B) having a structure in which a hydroxyl group is protected by a group which suppresses dissolution into an alkaline developer and which dissociates in the action of an acid; a repeating unit (C) having a lactone structure; and a repeating unit (D) having a cyclic ether structure, the difference in the copolymer concentration among a plurality of containers which were filled with copolymer solution from the same manufacturing lot is not more than a certain range, or the method includes a certain production step.
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申请公布号 |
US8377625(B2) |
申请公布日期 |
2013.02.19 |
申请号 |
US20090607324 |
申请日期 |
2009.10.28 |
申请人 |
MARUZEN PETROCHEMICAL CO., LTD.;YAMAGISHI TAKANORI;KATO ICHIRO;TANAKA AKIKO;ASANO MIYAKO |
发明人 |
YAMAGISHI TAKANORI;KATO ICHIRO;TANAKA AKIKO;ASANO MIYAKO |
分类号 |
G03F7/00 |
主分类号 |
G03F7/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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