| 摘要 |
A manufacturing apparatus and a manufacturing method for a quantum dot material. The manufacturing apparatus (10) adds an optical device (120) capable of generating an interference pattern in an existing epitaxial apparatus (110), so that a substrate (200) applies an interference pattern on an epitaxial layer while performing epitaxial growth. By means of the interference pattern, a regularly distributed temperature field is formed on the epitaxial layer, so that on the epitaxial layer, an atom aggregation phenomenon is formed at dot positions with higher temperature, but no atoms are aggregated on areas having relatively lower temperature. Therefore, according to the temperature distribution on the surface of the epitaxial layer, positions where quantum dots generate can be controlled manually without introducing defects, thereby achieving a defect-free and long-range ordered quantum dot manufacturing. |
