| 摘要 |
PURPOSE: A shower head and a substrate processing device using the same are provided to uniformly disperse process gas to the shower head by including a discharge part in a body. CONSTITUTION: A chamber(10) provides a substrate processing space and includes a first supply tube(120) to which process gas is supplied. A susceptor(30) supports a substrate. A shower head(20) sprays the process gas to the susceptor. The shower head includes a body(21), a second supply tube(121), and a discharge part(100). One or more discharge holes(22) are formed in the body. [Reference numerals] (AA) Process gas |
