| 摘要 |
<P>PROBLEM TO BE SOLVED: To prevent an unintended pattern from being exposed. <P>SOLUTION: A photo mask 9 includes a plurality of kinds of pattern regions 11 having different mask patterns, which are arranged on one mask substrate 10 such that the central axes thereof become parallel with each other. The photo mask includes: a plurality of slender openings 12 located at a position separated from each central axis by a constant distance in the direction to intersect the central axis of each pattern region 11 such that a longitudinal central axis of the opening runs parallel to the central axis; and at least one slit 13 that intersects the longitudinal central axis provided for identifying the mask pattern in each opening 12. Each slit 13 in each opening 12 is located at a different position on the longitudinal central axis of each opening 12. <P>COPYRIGHT: (C)2013,JPO&INPIT |
