| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide an electric conductor pattern forming method capable of forming an ultrafine conductor pattern which is hard to be formed by photolithography. <P>SOLUTION: A metal oxide film having first specific resistance is formed on a substrate and an electrode is brought into contact with a metal oxide film or is brought close to a fixed distance from the metal oxide film. In this state, by applying first voltage between the electrode and the metal oxide film, the specific resistance of the metal oxide film is locally changed and a high resistance region having second specific resistance which is higher than the first specific resistance is formed on the surface side of the metal oxide film. Then the electrode is brought into contact with the metal oxide film or is brought close to a fixed distance from the metal oxide film. In this state, by applying second voltage between the electrode and the metal oxide film, the specific resistance of the metal oxide film is locally changed and a conductor pattern having third specific resistance which is lower than the second specific resistance is formed on the surface side of the high resistance region. <P>COPYRIGHT: (C)2013,JPO&INPIT |
