METHOD OF MANUFACTURING MOLD FOR NANO IMPRINT

摘要

Provided is a method of manufacturing a mold for nano imprint comprising: forming a plurality of grid patterns on a substrate; forming a metal grid pattern on the grid patterns; forming a plated layer on the metal grid pattern; and separating a mold consisting of the metal grid pattern and the plated layer from the grid pattern, which can reduce a production cost, improve the efficiency of a process, and provide the mold for nano having improved durability and reliability.