| 摘要 |
<P>PROBLEM TO BE SOLVED: To solve the problems of a cylindrical target that there is the risk of peeling of a target material from a cylindrical base material as expansion and contraction are repeated during sputtering due to a difference of thermal expansion rates between the target material and the cylindrical base material, a difference of expansion between the cylindrical base material and the target material increases during sputtering since the target material is long and integrated, a crack is generated in the target material, and a defect is generated in a sputter film formed by sputtering or the like. <P>SOLUTION: A long-length target material is spirally wound around and attached to the outer peripheral surface of the cylindrical base material. <P>COPYRIGHT: (C)2013,JPO&INPIT |
