发明名称 PATTERN FORMING MATERIAL, AND PATTERN FORMING DEVICE AND PATTERN FORMING METHOD
摘要 The present invention aims to provide a pattern forming material that is capable of suppressing generation of wrinkles and static electric charge on a substrate in a lamination step in which the pattern forming material is laminated on the substrate as well as capable of forming a fine and precise pattern; a pattern forming apparatus provided with the pattern forming material; and a pattern forming process using the pattern forming material. To this end, the present invention provides a pattern forming material having a support, a photosensitive layer, and a protective film, the photosensitive layer and the protective film being formed in this order on the support, wherein the number of fish-eyes each having an area of 2,000mum2 or more and a maximum height measured from the film surface of 1mum to 7mum residing in the protective film is 50/m2 to 1,000/m2.
申请公布号 KR101228479(B1) 申请公布日期 2013.01.31
申请号 KR20077007724 申请日期 2005.09.05
申请人 发明人
分类号 G03F7/004;G03F7/11;G03F7/20 主分类号 G03F7/004
代理机构 代理人
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