发明名称 ANTENNA STRUCTURE OF PLASMA PROCESSING APPARATUS
摘要 <P>PROBLEM TO BE SOLVED: To improve the easiness of mounting a connecting member for connecting a supply-side electrode rod with a ground-side electrode rod in a conductive manner. <P>SOLUTION: An antenna structure of a plasma processing apparatus, includes: supply-side electrode rods 51 each connected to a supply side of an AC power supply, and suspended and supported so that its axial center is along a vertical direction in a processing chamber; ground-side electrode rods 52 each connected to a ground side of the AC power supply, and suspended and supported so as to face the supply-side electrode rod 51 in the processing chamber; a coupling member 60 having entry portions 62 allowing tip ends of the supply-side electrode rods 51 and the ground-side electrode rods 52 to enter provided in a main body 61, and suspended in the vicinities of the tip ends of both electrode rods 51 and 52 in a state in which the tip ends of both electrode rods 51 and 52 enter the entry portions 62; and connecting members 53 each having a pair of contact portions 53a disposed inside the entry portions 62 and in contact with the tip ends of both electrode rods 51 and 52, and a connecting portion 53b for connecting the pair of contact portions 53a. <P>COPYRIGHT: (C)2013,JPO&INPIT
申请公布号 JP2013020828(A) 申请公布日期 2013.01.31
申请号 JP20110153586 申请日期 2011.07.12
申请人 IHI CORP 发明人 MURAYAMA SATOSHI
分类号 H05H1/46;C23C16/503;H01L21/205 主分类号 H05H1/46
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