| 摘要 |
PROBLEM TO BE SOLVED: To provide a (co)polymer for a resist which ensures high sensitivity and/or resolution, when it is used in DUV excimer laser lithography or electron beam lithography. SOLUTION: The (co)polymer contains at least one monomeric unit selected from among monomeric units, having an alicyclic skeleton and monomeric units having a lactone skeleton and an end group of formula (1) (where R1 and R2 are each H, a 1-10C alkyl, -COO-RA, -X-COO-RA, -CONRB-RA,-X-CONRB- RA, -NRB-RA or -X-NRB-RA; R3 is cyano or a 2-10C cyanoalkyl; X is a 1-10C alkylene; and RA and RB are each H or a 1-10C alkyl) which is not included in the ends of each molecule. |
