| 摘要 |
<p>The invention relates to a process for calibrating the thermal dilatation of a cantilever in thermal dip-pen nanolithography. According to the invention, the process comprises several steps, as follows: in a first step an alignment mark (1) is carried out on a substrate (2), in a second step, by atomic force microscopy, there is taken over an image of the area which comprises the alignment mark (1) by using a cantilever at the ambient temperature, there is memorized the position of the alignment mark within the image, then the cantilever is brought to the initial position; in a third step, the cantilever is heated then there is taken over a new image of said area, while keeping constant the work parameters and the image settings, there are memorized the cantilever temperature and/or the electric current used for heating the same and there is determined the new position of the alignment mark (1) which is displaced on the image, on the direction of the cantilever length by a value equal to the thermal elongation thereof, then the cantilever is brought to the initial position; the third step is repeated at other temperatures so as to obtain the value of the cantilever elongation, then, by means of the resulting data, there is plotted an etalonation curve, by means of which the cantilever will be correctly positioned within a thermal dip-pen nanolithography deposition process. The invention is also applicable in any type of nanolithography which uses a heated cantilever in order to carry out the desired configurations.</p> |
