<p>SUSCEPTOR WITH SUPPORT BOSSESA susceptor for supporting a semiconductor wafer during a chemical vapor deposition process includes a body having opposing upper and lower surfaces. Support bosses extend downward from the lower face of the body. Each support boss has a boss opening sized and shaped for receiving a support post of a chemical vapor deposition device to mount the susceptor on the support post.FIG. 4</p>
申请公布号
SG186653(A1)
申请公布日期
2013.01.30
申请号
SG20120092045
申请日期
2008.12.22
申请人
MEMC ELECTRONIC MATERIALS, INC.
发明人
PITNEY, JOHN, A.;HAMANO, MANABU;HELLWIG, LANCE, G.