| 发明名称 |
Method for monitoring chamber cleanliness |
| 摘要 |
A method for evaluating a cleanliness of a tool, the method includes: receiving a wafer; cleaning the wafer; placing the wafer into the tool for a predefined period; removing the wafer from the tool, performing a contact angle measurement and determining the cleanliness of the wafer.
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| 申请公布号 |
US8361814(B2) |
申请公布日期 |
2013.01.29 |
| 申请号 |
US20060350516 |
申请日期 |
2006.02.09 |
| 申请人 |
APPLIED MATERIALS, ISRAEL, LTD.;SHEMESH DROR;EILON MICHAL;DOOZLI HEN;RECHAV EKATERINA;BINYAMINI EITAN |
发明人 |
SHEMESH DROR;EILON MICHAL;DOOZLI HEN;RECHAV EKATERINA;BINYAMINI EITAN |
| 分类号 |
G01R31/26;B08B3/00;B08B5/00;H01L21/66 |
主分类号 |
G01R31/26 |
| 代理机构 |
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