METHOD AND DEVICE FOR PRODUCING LOW-PARTICLE LAYERS ON SUBSTRATES
摘要
The invention relates to methods and devices for producing one or more low-particle layers on substrates in a vacuum. The layers are deposited onto the substrate from a cylindrical source material, optionally together with a reactive gas component, by means of magnetron sputtering. The layer is deposited against the force of gravity in a sputter-up method. During the method or within the device, the structure or stochiometric atomic composition of the layers can optionally be modified using a plasma source. Multiple sputtering sources with different source materials can be provided in the device such that multiple layers of different compositions can be applied on the substrate at a high speed in one process.
申请公布号
WO2013011149(A1)
申请公布日期
2013.01.24
申请号
WO2012EP64404
申请日期
2012.07.23
申请人
FRAUNHOFER-GESELLSCHAFT ZUR FOERDERUNG DER ANGEWANDTEN FORSCHUNG E.V.;VERGOEHL, MICHAEL;RADEMACHER, DANIEL;KRICHELDORF, HANS-ULRICH;BRAEUER, GUENTER