发明名称 |
POLYMERIZABLE ESTER COMPOUND, POLYMER, RESIST COMPOSITION, AND PATTERNING PROCESS |
摘要 |
PURPOSE: A polymerizable ester compound is provided to be used as a functional material or a material for medicine and agrochemical and to ensure excellent transparency. CONSTITUTION: A polymerizable ester compound is denoted by general formula 1 or 2. A polymer compound has repeat unit of general formula 2a or 2b. The polymer compound further contains one or more kinds of repeat units of general formulas 2A-2D. A resist material contains an organic solvent, an acid generator, and base resin containing the polymer compound. A method for forming a pattern comprises: a step of applying the resist material on a substrate; a step of interposing a photomask and exposing by high energy beam or electron beam; and a step of developing. |
申请公布号 |
KR20130009638(A) |
申请公布日期 |
2013.01.23 |
申请号 |
KR20120075045 |
申请日期 |
2012.07.10 |
申请人 |
SHIN-ETSU CHEMICAL CO., LTD. |
发明人 |
HASEGAWA KOJI;SAGEHASHI MASAYOSHI;SUKA YUUKI;IIO MASASHI |
分类号 |
C07D493/04;C08L37/00;G03F7/039 |
主分类号 |
C07D493/04 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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