发明名称 |
APPARATUS AND METHOD OF CONTROLLING CHUCK, AND EXPOSURE APPARATUS AND CONTROL METHOD THEREOF |
摘要 |
PURPOSE: An apparatus and method for controlling a chuck, an exposing device and a controlling method thereof are provided to reduce the leveling time of the chuck by previously tuning a parameter of the chuck. CONSTITUTION: A tilt element is detected in a chuck. A chuck tilt is controlled in the tilt element of the chuck(604). A parameter of the chuck is tuned after the chuck tilt is controlled(610). A tuning proce3s is based on the remaining tilt element of the chuck. The leveling is adjusted in the chuck. [Reference numerals] (602) Focus measurement(Z shift direction distance measurement)(1st); (604) Chuck tilt controlling; (606) Focus measurement(Z shift direction distance measurement)(2nd); (608) Is a residual tilt component existed?; (610) Executing parameter tuning based on a residual tilt component; (AA) Start; (BB) No; (CC) Yes; (DD) End |
申请公布号 |
KR20130007004(A) |
申请公布日期 |
2013.01.18 |
申请号 |
KR20110062879 |
申请日期 |
2011.06.28 |
申请人 |
SAMSUNG ELECTRONICS CO., LTD. |
发明人 |
KIM, JA YUL;JANG, SANG DON;SON, TAE KYU |
分类号 |
H01L21/683;H01L21/027;H01L21/68 |
主分类号 |
H01L21/683 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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