发明名称 APPARATUS AND METHOD OF CONTROLLING CHUCK, AND EXPOSURE APPARATUS AND CONTROL METHOD THEREOF
摘要 PURPOSE: An apparatus and method for controlling a chuck, an exposing device and a controlling method thereof are provided to reduce the leveling time of the chuck by previously tuning a parameter of the chuck. CONSTITUTION: A tilt element is detected in a chuck. A chuck tilt is controlled in the tilt element of the chuck(604). A parameter of the chuck is tuned after the chuck tilt is controlled(610). A tuning proce3s is based on the remaining tilt element of the chuck. The leveling is adjusted in the chuck. [Reference numerals] (602) Focus measurement(Z shift direction distance measurement)(1st); (604) Chuck tilt controlling; (606) Focus measurement(Z shift direction distance measurement)(2nd); (608) Is a residual tilt component existed?; (610) Executing parameter tuning based on a residual tilt component; (AA) Start; (BB) No; (CC) Yes; (DD) End
申请公布号 KR20130007004(A) 申请公布日期 2013.01.18
申请号 KR20110062879 申请日期 2011.06.28
申请人 SAMSUNG ELECTRONICS CO., LTD. 发明人 KIM, JA YUL;JANG, SANG DON;SON, TAE KYU
分类号 H01L21/683;H01L21/027;H01L21/68 主分类号 H01L21/683
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