发明名称 |
APPARATUS FOR PRODUCING SINGLE CRYSTAL SILICON |
摘要 |
<P>PROBLEM TO BE SOLVED: To prevent contamination from a heating element, to prevent contamination from a support shaft material and a sealing material between a support shaft and a housing and the deterioration of the sealing material by suppressing the temperature rising of the support shaft and to thereby produce high quality single crystal silicon. <P>SOLUTION: An apparatus for producing the single crystal silicon comprises: an exothermic ring having a conductive material capable of heating inductively by an induction heating coil and being disposed at the tip end of the rotatable support shaft 11 penetrating the wall of the housing; an operating means for reciprocating the exothermic ring between a heating position which is close to the induction heating coil between a seed crystal holder and a polycrystal holder and a standby position which is separated from the heating position by the rotation of the support shaft 11 at the support shaft 11; a sealing material 21A to hold airtightness at a penetration part between the wall of the housing and the support shaft 11; and a cooling flow path 14 which is formed in the support shaft 11 and in which a cooling medium flows. <P>COPYRIGHT: (C)2013,JPO&INPIT |
申请公布号 |
JP2013010691(A) |
申请公布日期 |
2013.01.17 |
申请号 |
JP20120232090 |
申请日期 |
2012.10.19 |
申请人 |
MITSUBISHI MATERIALS CORP |
发明人 |
CHIGUSA NOBORU;KITAGAWA TERUHISA;ITO KUNITAKE;ITO TAKANORI |
分类号 |
C30B29/06;C30B13/20 |
主分类号 |
C30B29/06 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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