| 发明名称 |
Projection optical system, exposure apparatus and method using the same |
| 摘要 |
A projection optical system includes an optical element that includes and locally uses a reflective or refractive area that is substantially axially symmetrical around an optical axis, the optical element being rotatable around the optical axis.
|
| 申请公布号 |
US7365826(B2) |
申请公布日期 |
2008.04.29 |
| 申请号 |
US20050302155 |
申请日期 |
2005.12.14 |
| 申请人 |
CANON KABUSHIKI KAISHA |
发明人 |
SUMIYOSHI YUHEI;SUZUKI MASAYUKI |
| 分类号 |
G03B27/52;G03F7/20;G03B27/42;G03B27/54;G03B27/68;H01L21/027 |
主分类号 |
G03B27/52 |
| 代理机构 |
|
代理人 |
|
| 主权项 |
|
| 地址 |
|
