发明名称 MANUFACTURING METHOD OF MODIFIED GROUP INTRODUCED SUBSTRATE, MANUFACTURING METHOD OF LIGAND IMMOBILIZATION SUBSTRATE, MODIFIED GROUP INTRODUCED SUBSTRATE AND LIGAND IMMOBILIZATION SUBSTRATE, AND INTERMOLECULAR INTERACTION DETECTING METHOD
摘要 <P>PROBLEM TO BE SOLVED: To provide a manufacturing method of a substrate facilitating a ligand immobilization operation to a substrate and easily assuring reproducibility of a ligand immobilization ratio, and to provide the substrate and an intermolecular interaction detecting method. <P>SOLUTION: The manufacturing method of ligand immobilization substrates includes: a step (a) for preparing a substrate having a surface comprising SiN (silicon nitride); a step (b) for introducing at least one modified group selected from groups of an epoxy group, an azido group, an isocyanate group, and an isothiocyanate group into the substrate surface comprising SiN (silicon nitride); and, effectively, a step (c) for immobilizing ligands including at least one reactive group selected from groups comprising a thiol group, an amino group, and a hydroxyl group on the surface of the substrate via the reaction between the reactive group and the modified group. <P>COPYRIGHT: (C)2013,JPO&INPIT
申请公布号 JP2013011465(A) 申请公布日期 2013.01.17
申请号 JP20110143128 申请日期 2011.06.28
申请人 KONICA MINOLTA ADVANCED LAYERS INC 发明人 KURIHARA YOSHIKAZU
分类号 G01N33/543 主分类号 G01N33/543
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