发明名称 CHARGED PARTICLE BEAM APPARATUS
摘要 PROBLEM TO BE SOLVED: To provide a charged particle beam apparatus in which a driving part has high stability and reliability by preventing a lubricant applied to a slide portion from being used up before maintenance of the apparatus. SOLUTION: The charged particle beam apparatus has the lubricant applied to the slide portion of a moving member moving in a vacuum chamber, wherein the lubricant satisfies the followings. (1) A cumulative slide time (induction time) for starting decomposition reaction of the lubricant in a depressed state is≥140 hours. (2) Depression (critical surface pressure) which causes decomposition reaction of the lubricant is≥0.5 GPa. COPYRIGHT: (C)2010,JPO&INPIT
申请公布号 JP2010021345(A) 申请公布日期 2010.01.28
申请号 JP20080180222 申请日期 2008.07.10
申请人 HITACHI LTD;IWATE UNIV 发明人 SAEKI TOMONORI;MORI MASAYUKI
分类号 H01L21/66;C10M105/04;C10M105/74;C10M109/02;C10M135/18;C10M135/20;C10M137/04;C10M137/12;C10N10/12;C10N40/06;H01J37/20 主分类号 H01L21/66
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