发明名称 |
CHARGED PARTICLE BEAM APPARATUS |
摘要 |
PROBLEM TO BE SOLVED: To provide a charged particle beam apparatus in which a driving part has high stability and reliability by preventing a lubricant applied to a slide portion from being used up before maintenance of the apparatus. SOLUTION: The charged particle beam apparatus has the lubricant applied to the slide portion of a moving member moving in a vacuum chamber, wherein the lubricant satisfies the followings. (1) A cumulative slide time (induction time) for starting decomposition reaction of the lubricant in a depressed state is≥140 hours. (2) Depression (critical surface pressure) which causes decomposition reaction of the lubricant is≥0.5 GPa. COPYRIGHT: (C)2010,JPO&INPIT |
申请公布号 |
JP2010021345(A) |
申请公布日期 |
2010.01.28 |
申请号 |
JP20080180222 |
申请日期 |
2008.07.10 |
申请人 |
HITACHI LTD;IWATE UNIV |
发明人 |
SAEKI TOMONORI;MORI MASAYUKI |
分类号 |
H01L21/66;C10M105/04;C10M105/74;C10M109/02;C10M135/18;C10M135/20;C10M137/04;C10M137/12;C10N10/12;C10N40/06;H01J37/20 |
主分类号 |
H01L21/66 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|