| 摘要 |
A method of fabrication or manufacture at micrometer and nanometer scale by spatially selective deposition of chemical substances so as to form a solid phase array on a substrate (10) which includes the steps of defining a region (15) on the substrate by forming an electrostatic charge on that region which is different from the electrostatic charge on other regions of the substrate such as by formation of a latent electrostatic image thereon, applying an emulsion to the substrate. The emulsion (16) has an electrically charged discontinuous phase and a component to be selectively deposited carried in or comprising the discontinuous phase. The discontinuous phase of the emulsion is attracted to the preselected region by attraction by the electrostatic charge on the region and deposition obtained with or without reaction. The electrostatic image may be formed by the use of photoconductor. The array formed may be for flat screen display panels, for manufacture of DNA chips, printed circuits, semiconductor chips, nanotechnology, micro-electromechanical systems, flexible printed circuits or the like. |
