Method of generating photomask data, method of fabricating photomask, non-transitory memory medium storing program for generating photomask data, method of manufacturing solid-state image sensor having microlens array and method of manufacturing microlens array

摘要

A method of generating photomask data for fabricating a microlens array, the photomask having a microlens pattern including light-shielding portions and non-light-shielding portions, a rectangular region including a surrounding region having four sides of the rectangular region as outer edges and a primary region having boundaries that are inner edges of the surrounding region, the surrounding region being configured by four strip regions each including one of the four sides as its part, and a width between each outer edge and each corresponding inner edge being not more than 1/2 of a wavelength of exposure light. The method includes determining a layout of light-shielding portions and non-light-shielding portions in the surrounding region so that a density of light-shielding portions is set to fall within a range from 0% to 15%.