发明名称 METHOD OF PROCESSING FLEXIBLE SUBSTRATE
摘要 <P>PROBLEM TO BE SOLVED: To provide a processing method that eliminates the needs of setting bending conditions and newly producing a bending device when a specification of a substrate is changed, and realizes high-quality bending. <P>SOLUTION: A processing method of a flexible substrate for bending a COF substrate at an arbitrary angle includes: a step S1 that is a bending property examination step for examining, on the basis of a cross-sectional area ratio between a base material and wirings of the COF substrate, the relationship between the cross-sectional area ratio and a bending angle of the flexible substrate; a step S2 that is a cross-sectional area ratio determination step for determining the cross-sectional area ratio of the COF substrate; and a step S3 that is a designing step for designing the COF substrate having the cross-sectional area ratio corresponding to the bending angle. <P>COPYRIGHT: (C)2013,JPO&INPIT
申请公布号 JP2013008792(A) 申请公布日期 2013.01.10
申请号 JP20110139550 申请日期 2011.06.23
申请人 SEIKO EPSON CORP 发明人 MIYAZAWA IKUYA
分类号 H05K3/00;H05K1/02 主分类号 H05K3/00
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