| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide new ion beam measurement. <P>SOLUTION: An ion beam measuring device 10 includes: a measurement beam source 20 for emitting a measurement beam 12 which generates interaction between the measurement beam 12 and an ion beam 14; and a measurement beam detector 22 for detecting the measurement beam 12 which is emitted from the measurement beam source 20 and irradiated with the ion beam 14. The ion beam measuring device 10 can be applied to, for example, an ion implanter. The ion beam measuring device 10 may be a beam monitor which provides output related to the ion beam to a control system of the ion implanter. <P>COPYRIGHT: (C)2013,JPO&INPIT |
