发明名称 SEMICONDUCTOR DEVICE AND METHOD FOR MANUFACTURING THE SAME
摘要 A gate electrode and an electrode for protective diode are coupled to each other. An insulating film below the electrode for protective diode makes a leak current flow between the electrode for protective diode and an electron transit layer and an electron supply layer when a voltage equal to or more than a given value is applied to the gate electrode. The given value is higher than a voltage by which a HEMT is on-operated and lower than a breakdown voltage of a gate insulating film.
申请公布号 US2013001696(A1) 申请公布日期 2013.01.03
申请号 US201213532963 申请日期 2012.06.26
申请人 FUJITSU SEMICONDUCTOR LIMITED;AKIYAMA SHINICHI;KOTANI YOSHIYUKI;WAKABAYASHI TOSHIHIRO;MIYAMOTO MASATO 发明人 AKIYAMA SHINICHI;KOTANI YOSHIYUKI;WAKABAYASHI TOSHIHIRO;MIYAMOTO MASATO
分类号 H01L27/06;H01L21/8252 主分类号 H01L27/06
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