发明名称 |
SEMICONDUCTOR DEVICE AND METHOD FOR MANUFACTURING THE SAME |
摘要 |
A gate electrode and an electrode for protective diode are coupled to each other. An insulating film below the electrode for protective diode makes a leak current flow between the electrode for protective diode and an electron transit layer and an electron supply layer when a voltage equal to or more than a given value is applied to the gate electrode. The given value is higher than a voltage by which a HEMT is on-operated and lower than a breakdown voltage of a gate insulating film.
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申请公布号 |
US2013001696(A1) |
申请公布日期 |
2013.01.03 |
申请号 |
US201213532963 |
申请日期 |
2012.06.26 |
申请人 |
FUJITSU SEMICONDUCTOR LIMITED;AKIYAMA SHINICHI;KOTANI YOSHIYUKI;WAKABAYASHI TOSHIHIRO;MIYAMOTO MASATO |
发明人 |
AKIYAMA SHINICHI;KOTANI YOSHIYUKI;WAKABAYASHI TOSHIHIRO;MIYAMOTO MASATO |
分类号 |
H01L27/06;H01L21/8252 |
主分类号 |
H01L27/06 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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