发明名称 |
Frequency Domain Layout Decomposition in Double Patterning Lithography |
摘要 |
A mechanism is provided for frequency domain layout decomposition in double pattern lithography (DPL) based on Fourier coefficient optimization (FCO). The Fourier transform of a layout represents the spatial frequency terms present in the layout. The mechanism models decomposed patterns for two exposures as a function of the corresponding Fourier coefficients. For each exposure, the mechanism sets the corresponding Fourier coefficients to zero for spatial frequency terms greater than the cut-off frequency of the optical system. The mechanism then optimizes non-zero Fourier coefficients for the two exposures to decompose the original target. The mechanism provides frequency domain optimization instead of conventional spatial domain methods, which naturally leads to optics-aware decomposition and stitch insertion in arbitrary two dimensional patterns.
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申请公布号 |
US2013003108(A1) |
申请公布日期 |
2013.01.03 |
申请号 |
US201113171513 |
申请日期 |
2011.06.29 |
申请人 |
INTERNATIONAL BUSINESS MACHINES CORPORATION;AGARWAL KANAK B.;BANERJEE SHAYAK |
发明人 |
AGARWAL KANAK B.;BANERJEE SHAYAK |
分类号 |
G03F7/20;G06F15/00 |
主分类号 |
G03F7/20 |
代理机构 |
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代理人 |
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地址 |
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