发明名称 CHARGED PARTICLE BEAM IRRADIATION DEVICE
摘要 <p>This charged particle beam irradiation device (1) comprises: a cyclotron (3) which accelerates charged particles and emits a charged particle beam (P); a vacuum duct (7) which transports the charged particle beam (P) emitted from the cyclotron (3) to an irradiation nozzle (5); an extension duct (10) which is disposed inside the irradiation nozzle (5) on the propagation path of the charged particle beam, has an interior filled with inert gas, and is provided with Kapton films (13, 14) at an inlet and an outlet, the Kapton films transmitting the charged particle beam (P); a gas supply unit (20) which supplies helium gas to the interior of the extension duct (10); a scanning magnet (12) which is disposed around the extension duct (10) and scans the charged particle beam (P); and a leak valve (36) which leaks helium gas in the extension duct (10) to the outside when the internal pressure of the extension duct (10) is greater than or equal to a set pressure. The gas supply unit (20) has supply lines (A-C) having different amounts of helium gas supply.</p>
申请公布号 WO2013002046(A1) 申请公布日期 2013.01.03
申请号 WO2012JP65386 申请日期 2012.06.15
申请人 SUMITOMO HEAVY INDUSTRIES, LTD.;OGASAWARA TSUYOSHI 发明人 OGASAWARA TSUYOSHI
分类号 G21K5/04;A61N5/10 主分类号 G21K5/04
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