发明名称 SEMICONDUCTOR MANUFACTURING APPARATUS
摘要 A semiconductor manufacturing apparatus is capable of reducing power consumption. The semiconductor manufacturing apparatus 1 includes a processing chamber 2 that has a top surface 2a and forms a processing space S therein; a mounting table 3 provided in the processing space S; an upper electrode 20 provided above the mounting table 3 to face the mounting table 3; heaters 35 and 36 provided around the upper electrode 20 and below the top surface 2a of the processing chamber 2 and configured to heat the upper electrode 20; and a heat insulating unit 50, mounted on the top surface 2a of the processing chamber 2, having a plate-shaped member 51 and a heat insulating member 52 that is provided on one main surface 51a of the plate-shaped member 51.
申请公布号 US2012325796(A1) 申请公布日期 2012.12.27
申请号 US201213528504 申请日期 2012.06.20
申请人 KOBAYASHI ATSUSHI;MIURA KAZUYUKI;YASUMURO AKIRA;TOKYO ELECTRON LIMITED 发明人 KOBAYASHI ATSUSHI;MIURA KAZUYUKI;YASUMURO AKIRA
分类号 F27D11/00 主分类号 F27D11/00
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