| 发明名称 |
Radiation Source, Lithographic Apparatus and Device Manufacturing Method |
| 摘要 |
A radiation source for generating extreme ultraviolet radiation for a lithographic apparatus has a debris mitigation device comprising a nozzle arranged at or near an intermediate focus (IF) of the beam of radiation. The nozzle serves to direct a flow of gas (330) towards the radiation source or collector optic in order to deflect particulate debris (43) emitted by the radiation source.
|
| 申请公布号 |
US2012327381(A1) |
申请公布日期 |
2012.12.27 |
| 申请号 |
US201113582261 |
申请日期 |
2011.01.31 |
| 申请人 |
LABETSKI DZMITRY;BANINE VADIM YEVGENYEVICH;LOOPSTRA ERIK ROELOF;YAKUNIN ANDREI MIKHAILOVICH;ASML NETHERLANDS B.V. |
发明人 |
LABETSKI DZMITRY;BANINE VADIM YEVGENYEVICH;LOOPSTRA ERIK ROELOF;YAKUNIN ANDREI MIKHAILOVICH |
| 分类号 |
G03B27/52 |
主分类号 |
G03B27/52 |
| 代理机构 |
|
代理人 |
|
| 主权项 |
|
| 地址 |
|
