发明名称 COMPOUND SEMICONDUCTOR DEVICE AND METHOD OF MANUFACTURING THE SAME
摘要 A compound semiconductor device includes a substrate; and a compound semiconductor multilayer structure which is formed above the substrate and which contains compound semiconductors containing Group III elements, wherein the compound semiconductor multilayer structure has a thickness of 10μm or less and a percentage of aluminum atoms is 50% or more of the number of atoms of the Group III elements.
申请公布号 US2012320642(A1) 申请公布日期 2012.12.20
申请号 US201213469564 申请日期 2012.05.11
申请人 IMANISHI KENJI;FUJITSU LIMITED 发明人 IMANISHI KENJI
分类号 H02M5/458;H01L21/20;H01L29/20;H03F3/19 主分类号 H02M5/458
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