| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a technique improving uniformity of in-plane characteristics of an optical film formed on a photomask blank. <P>SOLUTION: The photomask blank in which an optical film 20 is formed on a principal surface of a transparent substrate 10 is mounted on a susceptor 30. The peripheral edge of the optical film 20 formed on the principal surface of the substrate 10 is shielded by a light shielding part 60, from the application of flashlight from a flashlamp 40. The light shielding part 60 avoids such inconvenience that the flashlight incident from a chamfered part 11 is reflected by the rear face of the substrate 10 and the reflected light gives an excessive optical energy to the optical film 20. <P>COPYRIGHT: (C)2013,JPO&INPIT |
