COMPOSITION FOR WET ETCHING OF CRYSTALLIZED ITO

摘要

PURPOSE: An etching solution for a crystallized ITO(Indium-Tin Oxide) film is provided to is provided to prevent corrosion of equipment and damage to a photoresist and to effectively remove residues. CONSTITUTION: An etching solution for a crystallized ITO film comprises 10-20wt.% of hydrochloric acid, 1-20wt.% of a salt compound, and 100wt.% of deionized water. The salt compound is metallic halogen compound excluding ferric chloride. The etching solution is used for etching a transparent conductive film including ITO.