| 摘要 |
<P>PROBLEM TO BE SOLVED: To suppress transient phenomenon more than ever when processing gas supply is switched alternately, while preventing the processing gases from being mixed. <P>SOLUTION: When two kinds or more of processing gases(e.g. C<SB POS="POST">4</SB>F<SB POS="POST">6</SB>gas and C<SB POS="POST">4</SB>F<SB POS="POST">8</SB>gas) are supplied, while being switched alternately, into a processing chamber during plasma processing of a wafer, supply of each processing gas is turned on/off alternately by setting a predetermined flow rate and zero flow rate repeatedly in a mass flow controller(MFC) provided in the gas supply passage, while opening an on/off valve on the downstream side thereof, for each gas supply passage that supplies the switched processing gas. <P>COPYRIGHT: (C)2013,JPO&INPIT |
