PARTICLE MEASUREMENT METHOD, PARTICLE MEASUREMENT SYSTEM, AND PARTICLE MEASUREMENT DEVICE

摘要

PROBLEM TO BE SOLVED: To provide a method and device enabling prioritized and efficient maintenance by measuring particles during surface treatment, measuring a particle size distribution and a charged state, and specifying the source of the particles.

SOLUTION: A method comprises: disposing one or more base materials 4 for measuring particles in a vacuum chamber 1 using plasma 6; individually applying at least one of a higher potential than that of the plasma, an approximately identical potential, and a lower potential to the base materials 4 for measuring the particles to perform predetermined surface treatment, and then measuring a particle size distribution of the particles attached to the base materials; and calculating a charged state distribution for each particle size of the particles from the measurement result using a predetermined formula.

COPYRIGHT: (C)2013,JPO&INPIT