| 发明名称 |
System and method for self-aligned dual patterning |
| 摘要 |
A system and a method for self-aligned dual patterning are described. The system includes a platform for supporting a plurality of process chambers. An etch process chamber coupled to the platform. An ultra-violet radiation photo-resist curing process chamber is also coupled to the platform.
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| 申请公布号 |
US8323451(B2) |
申请公布日期 |
2012.12.04 |
| 申请号 |
US201113100147 |
申请日期 |
2011.05.03 |
| 申请人 |
NGAI CHRISTOPHER SIU WING;APPLIED MATERIALS, INC. |
发明人 |
NGAI CHRISTOPHER SIU WING |
| 分类号 |
C23F1/08;C23C16/00;H01L21/36 |
主分类号 |
C23F1/08 |
| 代理机构 |
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