| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a method of forming a reaction development image for obtaining sufficient photo resist by depositing a film (photo-resist layer) using a polycarbonate resin and a photoacid generating agent, irradiating the photo-resist layer masked with a desired pattern with ultraviolet rays, and developing an image using aqueous solution containing no organic solvents as developer. <P>SOLUTION: A method of forming a reaction development image is formed by irradiating a photo-resist layer masked with a desired pattern with ultraviolet rays, and then washing the layer with aqueous solution containing inorganic alkali represented with MOH, where M represents an alkali metal. The photo-resist layer comprises a polycarbonate resin, and a compound (photoacid generating agent) containing an organic group having a quinonediazide structure and a hydroxyl group. <P>COPYRIGHT: (C)2013,JPO&INPIT |
