发明名称 |
Scatterfield microscopical measuring method and apparatus |
摘要 |
The present invention provides a scatterfield microscopical measuring method and apparatus, which combine scatterfield detecting technology into microscopical device so that the microscopical device is capable of measuring the sample whose dimension is under the limit of optical diffraction. The scatterfield microscopical measuring apparatus is capable of being controlled to focus uniform and collimated light beam on back focal plane of an objective lens disposed above the sample. By changing the position of the focus position on the back focal plane, it is capable of being adjusted to change the incident angle with respect to the sample. |
申请公布号 |
US8319971(B2) |
申请公布日期 |
2012.11.27 |
申请号 |
US20080187057 |
申请日期 |
2008.08.06 |
申请人 |
SHYU DEH-MING;CHOU SEN-YIH;KU YI-SHA;INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE |
发明人 |
SHYU DEH-MING;CHOU SEN-YIH;KU YI-SHA |
分类号 |
G01N21/55 |
主分类号 |
G01N21/55 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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