| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a blank mask and a photomask for use in manufacturing of a flat panel display. <P>SOLUTION: The blank mask includes a light shielding film pattern formed in a region including a light shielding region on a transparent substrate and a phase inversion film formed on the exposed transparent substrate, and the phase inversion film has a phase difference of 160 to 200° relative to exposure light, and the light shielding film pattern and the phase inversion film are etched with the same etching material. Therefore, high resolution can be exhibited when a flat panel display (FPD) device is manufactured using an unmagnification exposure device, and in particular the blank mask is suitable for an unmagnification exposure device using a plurality of exposure light beams. <P>COPYRIGHT: (C)2013,JPO&INPIT |
