| 发明名称 |
RADIATION-SENSITIVE RESIN COMPOSITION, INTERLAYER INSULATING FILM FOR DISPLAY ELEMENT AND FORMATION METHOD THEREOF |
| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a radiation-sensitive resin composition having less film thickness variation of an unexposed part in addition to sufficient sensitivity; an interlayer insulating film for a display element formed from the radiation-sensitive resin composition; and a formation method thereof. <P>SOLUTION: The present invention is a radiation-sensitive resin composition containing a polymer comprising a structural unit (I) having a group represented by the formula (1) and a structural unit (II) having an epoxy group, in [A] the same or different polymer molecules, where the content of the structural unit (I) is 10 mol% or more and 90 mol% or less. The film thickness variation rate of a film thickness T<SB POS="POST">1</SB>after developing to a film thickness T<SB POS="POST">0</SB>before developing is effectively 90% or more. <P>COPYRIGHT: (C)2013,JPO&INPIT |
| 申请公布号 |
JP2012230134(A) |
申请公布日期 |
2012.11.22 |
| 申请号 |
JP20110096548 |
申请日期 |
2011.04.22 |
| 申请人 |
JSR CORP |
发明人 |
ICHINOHE DAIGO;YASHIRO TAKAO;TAZAKI TAICHI;MATSUMURA SHINJI |
| 分类号 |
G03F7/039;C08F220/18;H01L21/027;H01L51/50;H05B33/22 |
主分类号 |
G03F7/039 |
| 代理机构 |
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