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发明名称
一种电路工艺中的等离子体技术
摘要
本发明涉及一种电路工艺中的等离子体技术。其主要内容为低温放电等离子体理论、等离子体的整体均匀性及稳定性的理论研究及模拟计算、带电粒子在鞘层中的输运性质及等离子体加工工艺的过程控制。
申请公布号
CN102789511A
申请公布日期
2012.11.21
申请号
CN201110132633.4
申请日期
2011.05.20
申请人
张灵芝
发明人
张灵芝
分类号
G06F17/50(2006.01)I
主分类号
G06F17/50(2006.01)I
代理机构
代理人
主权项
一种电路工艺中的等离子体技术
地址
400700 重庆市北碚区歇马镇天马寨2号
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