<p>A CMOS or bipolar based Ion Sensitive Field Effect Transistor (ISFET) comprising an ion sensitive recess for holding a liquid wherein the recess is formed at least partly on top of a gate of the transistor. There is also provided a method of manufacturing an I on Sensitive Field Effect Transistor (ISFET) utilising CMOS processing steps, the method comprising forming an ion sensitive recess for holding a liquid at least partly on top of a gate of the transistor.</p>
申请公布号
WO2012152308(A1)
申请公布日期
2012.11.15
申请号
WO2011EP57359
申请日期
2011.05.06
申请人
X-FAB SEMICONDUCTOR FOUNDRIES AG;FANG, LING GANG;KOO, SANG SOOL