发明名称 |
Mask for increased uniformity in ion beam deposition |
摘要 |
A shaper mask for particle flux includes a central portion extending from a body of the shaper mask along a first axis to block at least a first portion of a particle flux through the shaper mask from a first direction. The mask also includes at least one off-axis portion. Each off-axis portions extends from the body of the shaper mask along a respective second axis different from the first axis. Each off-axis portion is shaped to block a respective second portion of the particle flux traveling through the shaper mask from a second direction different from the first direction.
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申请公布号 |
US8308921(B1) |
申请公布日期 |
2012.11.13 |
申请号 |
US20060643494 |
申请日期 |
2006.12.21 |
申请人 |
HINER HUGH C.;ZHAO LIJIE;HEGDE HARIHARAKESHAVA;WESTERN DIGITAL (FREMONT), LLC |
发明人 |
HINER HUGH C.;ZHAO LIJIE;HEGDE HARIHARAKESHAVA |
分类号 |
C23C14/00 |
主分类号 |
C23C14/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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