| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a lithographic method and/or an assembly where aberration sensitivity can be determined. <P>SOLUTION: There is provided a lithographic method of determining sensitivity of a property of a pattern feature to changes in optical aberrations of a lithographic apparatus used for providing a pattern feature. The method includes the steps of: controlling a configuration of the lithographic apparatus so as to establish a first aberration state; forming a first image of the pattern feature with the lithographic apparatus when the lithographic apparatus is in the first aberration state; measuring a property of the image; controlling a configuration of the lithographic apparatus so as to establish a second different aberration state; forming an image of the same pattern feature with the lithographic apparatus when the lithographic apparatus is in the second aberration state; measuring the same property of the image; and determining the sensitivity of the property of the pattern feature to the changes in the aberration state using the measurement value. <P>COPYRIGHT: (C)2013,JPO&INPIT |
