| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a film deposition apparatus and a film deposition method suitable for film deposition on an inner peripheral surface of a cylindrical body, and capable of suppressing damages caused by γ electrons. <P>SOLUTION: A target holder 9 holds a target 8 as a material of a sputter film, and the relatively negative electric potential is applied thereto. A cylindrical holder 2 holds a cylindrical body 1, and has a conductive part 2b which is constituted so that the relatively positive electric potential may be applied thereto. The conductive part 2b is exposed in an internal space of the cylindrical body 1 while the cylindrical body 1 is held by the cylindrical body holder 2. <P>COPYRIGHT: (C)2013,JPO&INPIT |
