| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide each of gas treating units with equal gas treatment performance and reduce the problems to be caused by excessive or insufficient gas treatment performance. <P>SOLUTION: In the gas treatment device, the value of voltage V2 to be applied by a high voltage source 15-2 for a downstream gas treating unit GU2 is set to be higher than the value of voltage V1 to be applied by a high voltage source 15-1 for an upstream gas treating unit GU1. The humidification level of a humidifier 17 is controlled so that the power consumption PW1 of the gas treating unit GU1 is equal to the power consumption PW2 of the gas treating unit GU2. Thus, the difference in plasma generation between the gas treating unit GU1 and the gas treating unit GU2 can be significantly reduced, and the gas treatment performance of the gas treatment units GU1 and GU2 can be equalized. <P>COPYRIGHT: (C)2013,JPO&INPIT |
