发明名称 |
PROCESSING CHAMBER WITH COOLED GAS DELIVERY LINE |
摘要 |
A method and apparatus for processing a substrate is provided. In one embodiment, the apparatus is in the form of a processing chamber that includes a chamber body having a processing volume defined therein. A substrate support, a gas delivery tube assembly and a plasma line source are disposed in the processing volume. The gas delivery tube assembly includes an inner tube is disposed in an outer tube. The inner tube has a passage for flowing a cooling fluid therein. The outer tube has a plurality of gas distribution apertures for providing processing gas into the processing volume.
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申请公布号 |
US2012279943(A1) |
申请公布日期 |
2012.11.08 |
申请号 |
US201213462939 |
申请日期 |
2012.05.03 |
申请人 |
NOMINANDA HELINDA;WON TAE KYUNG;CHO SEON-MEE;PARK BEOM SOO;CHOI SOO YOUNG;APPLIED MATERIALS, INC. |
发明人 |
NOMINANDA HELINDA;WON TAE KYUNG;CHO SEON-MEE;PARK BEOM SOO;CHOI SOO YOUNG |
分类号 |
C23C16/50;B05C9/00;B44C1/22;C23C16/511 |
主分类号 |
C23C16/50 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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