发明名称 |
Plasma Source for Charged Particle Beam System |
摘要 |
An inductively coupled plasma source for a focused charged particle beam system includes a dielectric liquid that insulates and cools the plasma chamber. A flow restrictor at an electrical potential that is a large fraction of the plasma potential reducing arcing because the voltage drop in the gas occurs primarily at relative high pressure.
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申请公布号 |
US2012280136(A1) |
申请公布日期 |
2012.11.08 |
申请号 |
US201213353032 |
申请日期 |
2012.01.18 |
申请人 |
ZHANG SHOUYIN;SMITH NOEL;SKOCZYLAS WALTER;FEI COMPANY |
发明人 |
ZHANG SHOUYIN;SMITH NOEL;SKOCZYLAS WALTER |
分类号 |
H01J3/14 |
主分类号 |
H01J3/14 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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