发明名称 Plasma Source for Charged Particle Beam System
摘要 An inductively coupled plasma source for a focused charged particle beam system includes a dielectric liquid that insulates and cools the plasma chamber. A flow restrictor at an electrical potential that is a large fraction of the plasma potential reducing arcing because the voltage drop in the gas occurs primarily at relative high pressure.
申请公布号 US2012280136(A1) 申请公布日期 2012.11.08
申请号 US201213353032 申请日期 2012.01.18
申请人 ZHANG SHOUYIN;SMITH NOEL;SKOCZYLAS WALTER;FEI COMPANY 发明人 ZHANG SHOUYIN;SMITH NOEL;SKOCZYLAS WALTER
分类号 H01J3/14 主分类号 H01J3/14
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