发明名称 |
TWO LAYER BARRIER ON POLYMERIC SUBSTRATE |
摘要 |
<p>Plasma treatment apparatus and method for producing a polymeric substrate using an atmospheric pressure glow discharge plasma in a treatment space formed between two or more opposing electrodes connected to a power supply using a gas composition in the treatment space comprising a precursor and oxygen. A first layer of inorganic material is deposited on a polymeric substrate with a largest thickness (d3) of at least 100% of an Rt-value being defined as the maximum peak to valley height of the profile of the polymeric substrate measured substantially perpendicular to the surface of the polymeric substrate. A second layer of inorganic material is deposited on the first layer, wherein in the treatment space the oxygen has a concentration of 3% or higher, and the power supply is controlled to provide an energy across a gap between the two or more opposing electrodes of 40 J/cm2 or higher.</p> |
申请公布号 |
EP2396451(B1) |
申请公布日期 |
2012.11.07 |
申请号 |
EP20100703949 |
申请日期 |
2010.02.10 |
申请人 |
FUJIFILM MANUFACTURING EUROPE BV |
发明人 |
DE VRIES, HINDRIK;VAN DE SANDEN, MAURITIUS |
分类号 |
C23C16/40;B05D7/24;C23C16/02 |
主分类号 |
C23C16/40 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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