| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a vapor phase growth system in which a problem of the displacement of a susceptor is not caused in replacement of the susceptor. <P>SOLUTION: A vapor phase growth system 1 according to the invention comprises: a reaction chamber 5 in which a susceptor 3 is removably set, and a vapor phase growth is performed; a transfer robot 7 for transferring the susceptor 3; a glow box 9 in which the transfer robot 7 and the reaction chamber 5 are housed; a replacement table 11 for temporarily putting the susceptor 3 in the replacement of the susceptor 3, which is set in the glow box 9; and a replacement box 13 provided on a side wall of the glow box 9 for replacement of the susceptor 3. The replacement table 11 includes a positioning device 15 on putting the susceptor 3, the positioning device rotates and then stops at a given rotational position, whereby the location of the susceptor 3 in its rotating direction is determined. <P>COPYRIGHT: (C)2013,JPO&INPIT |
